Patent attributes
A semiconductor device has an element interconnection 2, a top-layer element interconnection 4, a super-connect interconnection 10 and a bump 7. The element interconnection 2 is provided on a semiconductor substrate 1 through a plurality of insulating layers 50. The top-layer element interconnection 4 is formed above the element interconnection 2 by using a substantially equivalent process equipment. The super-connect interconnection 10 is provided on the top-layer element interconnection 4 through a super-connect insulating layer 9 having a thickness five or more times larger than that of the insulating layer 5, and has a thickness three or more times larger than that of each the element interconnection 2 and the top-layer element interconnection 4. The bump 7 is formed on the super-connect interconnection 10. The top-layer element interconnection 4 has a signal pad 4s, a power source pad 4v and a ground pad 4g. An area of the signal pad 4s is smaller than each area of the power source pad 4v and the ground pad 4g.
