Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
August 30, 2011
Patent Application Number
12384135
Date Filed
April 1, 2009
Patent Primary Examiner
Patent abstract
A wafer bonding method includes providing a primary wafer and a plurality of secondary wafers, wherein the primary wafer is larger than the secondary wafers. An intermediate material layer is formed on at least one of a bonding surface of the primary wafer and bonding surfaces of the secondary wafers. The intermediate material layer has a thermal expansion coefficient greater than the thermal expansion coefficient of the primary wafer and the thermal expansion coefficient of the secondary wafers. The secondary wafers are bonded onto the primary wafer.
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