Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 6, 2011
Patent Application Number
10412640
Date Filed
April 11, 2003
Patent Primary Examiner
Patent abstract
New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
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