Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kie Y. Ahn0
Leonard Forbes0
Date of Patent
February 28, 2012
0Patent Application Number
111789140
Date Filed
July 11, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A dielectric film containing a HfO2/ZrO2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using SiO2. A dielectric layer containing a HfO2/ZrO2 nanolaminate may be realized in a wide variety of electronic devices and systems.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
