US Patent 8128831 Plasma etching method and computer-readable storage medium
Patent 8128831 was granted and assigned to Tokyo Electron on March, 2012 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
December 28, 2006
Date of Patent
March 6, 2012
Patent Application Number
11617440
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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