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US Patent 8152925 Baffle plate and substrate processing apparatus

Patent 8152925 was granted and assigned to Tokyo Electron on April, 2012 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12112923 Reaction chamber lining
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Patent abstract

A baffle plate, provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, has a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber. The baffle plate has a stacked structure including a plurality of plate-shaped members. The baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.

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Patent Inventor Names
Hachishiro Iizuka0
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US Patent 08152925 Baffle plate and substrate processing apparatus US Patent 8152925 Baffle plate and substrate processing apparatus

Infobox
Patent Number
081529250
Patent Number
81529250
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edited on 29 Mar, 2023
Infobox
Is a
Patent
Patent
0
Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
081529250
Date of Patent
April 10, 2012
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Patent Application Number
124835450
Date Filed
June 12, 2009
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Patent Primary Examiner
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Rudy Zervigon
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 US Patent 08152925 Baffle plate and substrate processing apparatus

Infobox
Is a
Patent
Patent
Current assignee
Tokyo Electron
Tokyo Electron
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08152925
Date of patent
April 10, 2012
Patent application number
12483545
Date Filed
June 12, 2009
Patent primary examiner
‌
Rudy Zervigon

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