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US Patent 8204295 Photo-mask and wafer image reconstruction

Patent 8204295 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on June, 2012 by the United States Patent and Trademark Office.

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Patent abstract

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

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