Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
July 17, 2012
Patent Application Number
12216524
Date Filed
July 7, 2008
Patent Citations Received
0
...
Patent Primary Examiner
Patent abstract
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.