US Patent 8251011 Plasma processing apparatus
Patent 8251011 was granted and assigned to Tokyo Electron on August, 2012 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
May 31, 2007
Date of Patent
August 28, 2012
Patent Application Number
11756097
Patent Inventor Names
Yohei Yamazawa
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Akitaka Shimizu
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Asao Yamashita
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Chishio Koshimizu
0
DongSheng Zhang
0
Fumihiko Higuchi
0
Manabu Iwata
0
Michiko Nakaya
0
Nobuhiro Iwama
0
Norikazu Murakami
0
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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