US Patent 8275190 Method and apparatus for inspecting pattern defects

Patent 8275190 was granted and assigned to Hitachi on September, 2012 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

82751900

Patent Inventor Names

Kaoru Sakai0

Takafumi Okabe0

Shunji Maeda0

Date of Patent

September 25, 2012

Patent Application Number

132144200

Date Filed

August 22, 2011

Patent Citations Received

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US Patent 11694456 Object detection and image cropping using a multi-detector approach

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US Patent 11836914 Information processing method and information processing device for detecting a trace formed on a surface of a workpiece

Patent Primary Examiner

‌

Gregory M Desire

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