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US Patent 8308529 High throughput chemical mechanical polishing system

Patent 8308529 was granted and assigned to Applied Materials on November, 2012 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8308529

Patent Inventor Names

Alpay Yilmaz0

Allen L. D'Ambra0

Date of Patent

November 13, 2012

Patent Application Number

12427411

Date Filed

April 21, 2009

Patent Citations Received

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US Patent 11749552 Wafer processing tools and methods thereof

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US Patent 11921517 Controlling movement of a robotic cleaning device

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US Patent 11710648 Drying environments for reducing substrate defects

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US Patent 11712142 System of robotic cleaning devices

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US Patent 11705354 Substrate handling systems

Patent Primary Examiner

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Hadi Shakeri

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