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US Patent 8329054 Plasma processing apparatus and plasma processing method

Patent 8329054 was granted and assigned to Hitachi on December, 2012 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8329054

Patent Inventor Names

Ryoji Nishio0

Shinji Obama0

Takamasa Ichino0

Date of Patent

December 11, 2012

Patent Application Number

12193274

Date Filed

August 18, 2008

Patent Citations Received

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US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system

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US Patent 11670487 Bias supply control and data processing

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US Patent 11842884 Spatial monitoring and control of plasma processing environments

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US Patent 11887812 Bias supply with a single controlled switch

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US Patent 11942309 Bias supply with resonant switching

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US Patent 11978613 Transition control in a bias supply

Patent Primary Examiner

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Anita Alanko

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