US Patent 8329257 Methods and apparatuses for depositing nanometric filamentary structures
Patent 8329257 was granted and assigned to Institut national de la recherche scientifique on December, 2012 by the United States Patent and Trademark Office.
US Patent 08329257 Methods and apparatuses for depositing nanometric filamentary structuresUS Patent 8329257 Methods and apparatuses for depositing nanometric filamentary structures