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US Patent 8337282 Polishing pad

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Is a

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Inventor Names

Shinichi Matsumura0

Jaehong Park0

Kouichi Yoshida0

Masaharu Kinoshita0

Yoshitane Shigeta0

Date of Patent

December 25, 2012

Patent Application Number

12440184

Date Filed

August 31, 2007

Patent Citations Received

US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

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US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process

US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process

US Patent 11851570 Anionic polishing pads formed by printing processes

0

US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ

0

US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes

0

US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential

0

US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods

0

...

Patent Primary Examiner

Timothy V. Eley

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