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US Patent 8339595 Diffraction based overlay metrology tool and method

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Is a

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

December 25, 2012

Patent Application Number

12747795

Date Filed

December 9, 2008

Patent Citations Received

US Patent 12066764 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

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US Patent 11966169 Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof

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US Patent 11994808 Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof

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US Patent 12061421 Method and system for determining information about a target structure

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US Patent 11669079 Tool health monitoring and classifications with virtual metrology and incoming wafer monitoring enhancements

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US Patent 11709436 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

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US Patent 11710668 Method and apparatus to determine a patterning process parameter

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US Patent 11775714 Rational decision-making tool for semiconductor processes

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