US Patent 8382801 Spinous process implants, instruments, and methods

Spinous process implants and associated methods are shown and described. In one aspect, the implant limits the maximum spacing between the spinous processes. In another aspect, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect, instrumentation for inserting the implant is provided. In other aspects, methods for treating spine disease are provided.