Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Z Serpil Gonen Williams0
Gregory D. Cooper0
Larry F. Thompson0
Zhiyun Chen0
Date of Patent
February 26, 2013
0Patent Application Number
117741710
Date Filed
July 6, 2007
0Patent Citations Received
Patent Primary Examiner
Patent abstract
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
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