Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Satyadev Nagaraja0
Date of Patent
April 2, 2013
0Patent Application Number
128308560
Date Filed
July 6, 2010
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Image sensors have photodiodes separated by isolations regions formed from p-well or n-well implants. Isolation regions may be formed that are narrow and deep. Isolation regions may be formed in a multi-step process that selectively places implants at desired depths in a substrate. Complementary photoresist patterns may be used. To form an implant near the surface of a substrate, a photoresist pattern with openings over the desired implant area may be used. Subsequent implantation may use a complementary pattern such that ions pass through photoresist before implanting in desired regions of a substrate.
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