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US Patent 8441772 Substrate for electrostatic chuck and electrostatic chuck

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
October 22, 2010
Date of Patent
May 14, 2013
Patent Application Number
12910493
Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
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US Patent 12111341 In-situ electric field detection method and apparatus
0
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US Patent 12119254 Electrostatic chuck assembly for plasma processing apparatus
0
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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing
0
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
0
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11837493 Electrostatic chuck assembly for plasma processing apparatus
0
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8441772
Patent Primary Examiner
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Jared Fureman

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