Create
Log in
Sign up
Golden has been acquired by ComplyAdvantage.
Read about it here ⟶
US Patent 8468473 Method for high volume e-beam lithography
Overview
Structured Data
Issues
Contributors
Activity
Access by API
Access by API
Is a
Patent
Date Filed
June 8, 2012
Date of Patent
June 18, 2013
Patent Application Number
13492408
Patent Citations Received
US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer
0
US Patent 11664237 Semiconductor device having improved overlay shift tolerance
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
8468473
Patent Primary Examiner
Vuthe Siek
Find more entities like US Patent 8468473 Method for high volume e-beam lithography
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Company
Home
Press & Media
Blog
Careers
WE'RE HIRING
Products
Knowledge Graph
Query Tool
Data Requests
Knowledge Storage
API
Pricing
Enterprise
ChatGPT Plugin
Legal
Terms of Service
Enterprise Terms of Service
Privacy Policy
Help
Help center
API Documentation
Contact Us
SUBSCRIBE