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US Patent 8524427 Electron beam lithography system and method for improving throughput

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

September 3, 2013

Patent Application Number

13087133

Date Filed

April 14, 2011

Patent Citations Received

US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer

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US Patent 11664237 Semiconductor device having improved overlay shift tolerance

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Patent Primary Examiner

Christopher Young

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