Patent attributes
There is provided an exhaust gas purifying filter, which includes an inflow surface into which exhaust gas including particulate matter flows, an exhaust surface from which purified gas is exhausted, and a filter substrate which is constructed of a porous body, the filter substrate including a porous partition and a gas passage which is enclosed by the porous partition, a porous film which includes silicon carbide is provided on a surface of the porous partition, and in a pore diameter distribution of the porous film, pores with the pore diameter of 0.01 μm or more and 3.0 μm or less are 70% or more of total volume of the pores, and pores with the pore diameter of 0.01 μm or more and 0.3 μm or less are 5% or more and 90% or less of total volume of the pores.
