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US Patent 8677511 Apparatus for charged particle lithography system

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Date of Patent

March 18, 2014

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Patent Application Number

134623150

Date Filed

May 2, 2012

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Patent Citations Received

US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer

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US Patent 11664237 Semiconductor device having improved overlay shift tolerance

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Patent Primary Examiner

Nicole Ippolito

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