Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 25, 2014
Patent Application Number
13564334
Date Filed
August 1, 2012
Patent Citations Received
0
0
Patent Primary Examiner
Patent abstract
A method of fabricating an extreme ultraviolet (EUV) mask is disclosed. The method includes providing a substrate, forming a reflective multilayer (ML) over the substrate, forming a buffer layer over the reflective ML, forming an absorption layer over the buffer layer and forming a capping layer over the absorption layer. The capping layer and the absorption layer are etched to form the EUV mask.
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