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US Patent 8687766 Enhancing accuracy of fast high-resolution X-ray diffractometry

Patent 8687766 was granted and assigned to Jordan Valley Semiconductors on April, 2014 by the United States Patent and Trademark Office.

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Patent
Patent

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Current Assignee
Jordan Valley Semiconductors
Jordan Valley Semiconductors
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8687766
Patent Inventor Names
David Berman0
Alexander Krohmal0
Gennady Openganden0
Matthew Wormington0
Date of Patent
April 1, 2014
Patent Application Number
13180568
Date Filed
July 12, 2011
Patent Citations Received
‌
US Patent 11781999 Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
Patent Primary Examiner
‌
Hoon Song
Patent abstract

A method for analysis includes directing a converging beam of X-rays toward a surface of a sample and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum of the sample. The diffraction spectrum is corrected to compensate for a non-uniform property of the converging beam.

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