Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ching-Fang Yu0
Sheng-Chi Chin0
Ting-Hao Hsu0
Date of Patent
April 8, 2014
0Patent Application Number
133281660
Date Filed
December 16, 2011
0Patent Citations Received
0
0
...
Patent Primary Examiner
Patent abstract
An extreme ultraviolet (EUV) mask can be used in lithography, such as is used in the fabrication of a semiconductor wafer. The EUV mask includes a low thermal expansion material (LTEM) substrate and a reflective multilayer (ML) disposed thereon. A capping layer is disposed on the reflective ML and a patterned absorption layer disposed on the capping layer. The pattern includes an antireflection (ARC) type pattern.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
