Is a
Patent attributes
Patent Applicant
Patent Jurisdiction
Patent Number
Date of Patent
May 6, 2014
Patent Application Number
13766978
Date Filed
February 14, 2013
Patent Citations Received
0
...
Patent Primary Examiner
Patent abstract
A semiconductor device manufacturing method includes exciting plasma, applying RF power onto a target substrate to generate substrate bias and performing an ion implantation plural times by applying the RF power in the form of pulses.
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