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US Patent 8716841 Photolithography mask and process

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
March 14, 2013
Date of Patent
May 6, 2014
Patent Application Number
13831169
Patent Citations Received
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US Patent 12085867 Lithography process monitoring method
0
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US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer
0
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US Patent 12062542 Using cumulative heat amount data to qualify hot plate used for postexposure baking
0
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US Patent 12087579 Method for forming semiconductor device
0
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US Patent 11664237 Semiconductor device having improved overlay shift tolerance
0
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US Patent 11756789 Semiconductor manufacturing method and apparatus thereof
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US Patent 11782352 Lithography process monitoring method
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US Patent 11853674 Methods and systems for integrated circuit photomask patterning
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8716841
Patent Primary Examiner
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Roy Potter

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