US Patent 8728956 Plasma activated conformal film deposition
Is a
Date Filed
April 11, 2011
0
Date of Patent
May 20, 2014
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Patent Application Number
13084399
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Patent Citations Received
Patent Inventor Names
Bart J. van Schravendijk
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Dennis M. Hausmann
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Easwar Srinivasan
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Hu Kang
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Jon Henri
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Mandyam Sriram
0
Ming Li
0
Ramesh Chandrasekharan
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Shankar Swaminathan
0
Thomas Jewell
0
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