US Patent 8785084 Method for mask fabrication and repair

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

87850840

Patent Inventor Names

Shinn-Sheng Yu0

Yen-Cheng Lu0

Anthony Yen0

Date of Patent

July 22, 2014

Patent Application Number

136029160

Date Filed

September 4, 2012

Patent Citations Received

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US Patent 11664237 Semiconductor device having improved overlay shift tolerance

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US Patent 11835864 Multi-function overlay marks for reducing noise and extracting focus and critical dimension information

‌

US Patent 11852966 Lithography mask with a black border regions and method of fabricating the same

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US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer

Patent Primary Examiner

‌

Stephen Rosasco

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