US Patent 8851886 Substrate processing apparatus and method of manufacturing semiconductor device

Patent 8851886 was granted and assigned to Hitachi Kokusai Electric Inc. on October, 2014 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

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Hitachi Kokusai Electric Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

88518860

Patent Inventor Names

Akihiro Sato0

Shuhei Saido0

Takayuki Nakada0

Tomoyuki Matsuda0

Akinori Tanaka0

Shigeo Nakada0

Shinya Morita0

Date of Patent

October 7, 2014

Patent Application Number

123630590

Date Filed

January 30, 2009

Patent Citations Received

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US Patent 11881420 Light-irradiation thermal treatment apparatus

Patent Primary Examiner

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Gregory A. Wilson

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