US Patent 8900999 Low temperature high pressure high H

Patent 8900999 was granted and assigned to Applied Materials on December, 2014 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

89009990

Patent Inventor Names

Kiejin Park0

Joshua Collins0

Kai Wu0

Sang-Hyeob Lee0

Date of Patent

December 2, 2014

Patent Application Number

140361570

Date Filed

September 25, 2013

Patent Citations Received

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US Patent 11967525 Selective tungsten deposition at low temperatures

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US Patent 11791327 Three-dimensional memory device having support-die-assisted source power distribution and method of making thereof

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