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US Patent 8916056 Biasing system for a plasma processing apparatus

Patent 8916056 was granted and assigned to Varian Semiconductor Equipment Associates on December, 2014 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Varian Semiconductor Equipment Associates

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

89160560

Patent Inventor Names

Richard M. White0

Bon-Woong Koo0

Date of Patent

December 23, 2014

Patent Application Number

136491590

Date Filed

October 11, 2012

Patent Citations Received

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US Patent 12125673 Pulsed voltage source for plasma processing applications

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US Patent 11972924 Pulsed voltage source for plasma processing applications

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US Patent 11984306 Plasma chamber and chamber component cleaning methods

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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber

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US Patent 12111341 In-situ electric field detection method and apparatus

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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing

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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform

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Patent Primary Examiner

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Shamim Ahmed

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