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US Patent 8921814 Photon source, metrology apparatus, lithographic system and device manufacturing method

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Johannes Matheus Marie De Wit0

Vladimir Mihailovitch Krivtsun0

Gerbrand Van Der Zouw0

Henricus Petrus Maria Pellemans0

Pavel Stanislavovich Antsiferov0

Ralph Josef Johannes Gerardus Anna M Smeets0

Date of Patent

December 30, 2014

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Patent Application Number

139022850

Date Filed

May 24, 2013

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Patent Citations Received

US Patent 11978620 Swirler for laser-sustained plasma light source with reverse vortex flow

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US Patent 11670497 Light emitting sealed body and light source device

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US Patent 11676809 Light emitting sealed body and light source device

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US Patent 11690162 Laser-sustained plasma light source with gas vortex flow

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US Patent 11776804 Laser-sustained plasma light source with reverse vortex flow

US Patent 11844172 System and method for vacuum ultraviolet lamp assisted ignition of oxygen-containing laser sustained plasma sources

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US Patent 11862922 Light emitting sealed body and light source device

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Patent Primary Examiner

Nicole Ippolito

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