Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 3, 2015
Patent Application Number
14107540
Date Filed
December 16, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
The present disclosure provides a method of improving a layer to layer overlay error by an electron beam lithography system. The method includes generating a smart boundary of two subfields at the first pattern layer and obeying the smart boundary at all consecutive pattern layers. The same subfield is exposed by the same electron beam writer at all pattern layers. The overlay error caused by the different electron beam at different layer is improved.
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