Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yi Liu0
Young Cheol Bae0
Jong Keun Park0
Rosemary Bell0
Seung-Hyun Lee0
Thomas Cardolaccia0
Date of Patent
March 10, 2015
0Patent Application Number
134075080
Date Filed
February 28, 2012
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
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