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US Patent 8986585 Method of manufacturing chemical mechanical polishing layers having a window

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

George H. McClain0

Jeffrey Borcherdt Miller0

Kathleen McHugh0

Christopher A. Young0

Durron A. Hutt0

James T. Murnane0

Robert A. Brady0

Brian T. Cantrell0

Date of Patent

March 24, 2015

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Patent Application Number

134274080

Date Filed

March 22, 2012

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Patent Citations Received

US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

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US Patent 11685014 Formulations for advanced polishing pads

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US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process

US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process

US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ

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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes

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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential

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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods

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Patent Primary Examiner

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Patent abstract

A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.

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