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US Patent 9035249 Multi-beam system for high throughput EBI

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9035249
Date of Patent
May 19, 2015
Patent Application Number
14174651
Date Filed
February 6, 2014
Patent Citations Received
‌
US Patent 12080515 Apparatus for multiple charged-particle beams
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US Patent RE49784 Apparatus of plural charged-particle beams
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US Patent 12087541 Apparatus of plural charged-particle beams
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US Patent 11688580 Apparatus of plural charged-particle beams
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US Patent 11699564 Schottky thermal field emitter with integrated beam splitter
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US Patent 11804355 Apparatus for multiple charged-particle beams
Patent Primary Examiner
‌
David A. Vanore
Patent abstract

A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

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