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US Patent 9081302 Inspection apparatus and method, lithographic apparatus and lithographic processing cell

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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
90813020
Date of Patent
July 14, 2015
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Patent Application Number
132288100
Date Filed
September 9, 2011
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Patent Citations Received
‌
US Patent 11675276 Metrology apparatus and photonic crystal fiber
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Patent Primary Examiner
‌
Peter B. Kim
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Patent abstract

An “angle-resolved” version of FD-OCT is used to measure reflectance properties. An inspection apparatus comprises an illumination source configured to provide an illumination beam, an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and to use radiation reflected from the substrate with a reference beam derived from the illumination beam to produce an output beam, a sampling device arranged to select a portion of the output beam, a spectrometer configured to receive the selected portion of the output beam and to measure a spectrum of the received selected portion of the output beam, and a processor configured to determine from the measured spectrum reflectance properties of the target such as raw spectrometer spectral data, the Fourier transformed data, the extracted intensity components or carrier phase or the calculated complex reflectance.

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