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US Patent 9105452 Etching apparatus and etching method
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Patent
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Date Filed
March 6, 2014
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Date of Patent
August 11, 2015
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Patent Application Number
14199160
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Patent Citations Received
US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11967483 Plasma excitation with ion energy control
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•••
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9105452
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Patent Primary Examiner
Sylvia R. MacArthur
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