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US Patent 9111062 Fast freeform source and mask co-optimization method
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Patent
Date Filed
November 8, 2013
Date of Patent
August 18, 2015
Patent Application Number
14075917
Patent Citations Received
US Patent 11768440 Training methods for machine learning assisted optical proximity error correction
US Patent 11972194 Method for determining patterning device pattern based on manufacturability
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
9111062
Patent Primary Examiner
Stacy Whitmore
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