Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 25, 2015
0Patent Application Number
133363700
Date Filed
December 23, 2011
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.