US Patent 9123509 Techniques for plasma processing a substrate
Patent 9123509 was granted and assigned to Varian Semiconductor Equipment Associates on September, 2015 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
June 9, 2011
Date of Patent
September 1, 2015
Patent Application Number
13157005
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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