US Patent 9171920 Gate structure
Patent 9171920 was granted and assigned to National Chiao Tung University on October, 2015 by the United States Patent and Trademark Office.
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Patent abstract
The present invention discloses a gate structure, which is applied for an electronic component comprising a substrate and an active region defined thereon, and such the gate structure is disposed in the active region and is a T-shaped gate having a stem with a height of 250 nm. Preferably, the gate structure has a gate length of 60 nm.
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US Patent 09171920 Gate structure US Patent 9171920 Gate structure
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Patent Number
0917192000
Patent Number
917192000
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
091719200
Date of Patent
October 27, 2015
0Patent Application Number
141807140
Date Filed
February 14, 2014
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
091719200
Date of Patent
October 27, 2015
0Patent Application Number
141807140
Date Filed
February 14, 2014
0Official Website
Patent Primary Examiner
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US Patent 09171920 Gate structure
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
09171920
Date of patent
October 27, 2015
Patent application number
14180714
Date Filed
February 14, 2014
Patent primary examiner
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