Is a
Patent attributes
Patent Applicant
Patent Jurisdiction
Patent Number
Patent Inventor Names
Xinyu Fu0
Atif Noori0
Avgerinos V. Gelatos0
David Thompson0
Mei Chang0
Srinivas Gandikota0
Steve G. Ghanayem0
Date of Patent
January 5, 2016
0Patent Application Number
140628040
Date Filed
October 24, 2013
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WCl5 or WCl6.
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