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US Patent 9273392 Apparatus for atomic layer deposition
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Patent
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Date Filed
January 30, 2012
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Date of Patent
March 1, 2016
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Patent Application Number
13982270
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Patent Citations Received
US Patent 11946142 Spatially tunable deposition to compensate within wafer differential bow
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US Patent 11851760 PECVD deposition system for deposition on selective side of the substrate
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Patent Inventor Names
Adrianus Johannes Petrus Maria Vermeer
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Joseph Adrianus Maria De Swart
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Robert Coenraad Wit
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9273392
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Patent Primary Examiner
Jeffrie R. Lund
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