Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Daniel J. Hoffman0
Randy Heckman0
Victor Brouk0
Date of Patent
March 15, 2016
Patent Application Number
12870837
Date Filed
August 29, 2010
Patent Citations Received
0
0
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Patent Primary Examiner
Patent abstract
Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
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