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US Patent 9293366 Through-substrate vias with improved connections
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Patent
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Date Filed
April 28, 2010
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Date of Patent
March 22, 2016
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Patent Application Number
12769251
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Patent Citations Received
US Patent 11804419 Semiconductor device
US Patent 12008302 Integrated circuit with thicker metal lines on lower metallization layer
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Patent Inventor Names
Jing-Cheng Lin
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Ku-Feng Yang
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9293366
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Patent Primary Examiner
Jerome Jackson, Jr.
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