Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 7, 2016
Patent Application Number
13542014
Date Filed
July 5, 2012
Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition is provided comprising a (co)polymer comprising recurring units of acid labile group-substituted (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid and/or recurring units having an acid labile group-substituted phenolic hydroxyl group, an acid generator, and a metal salt of carboxylic acid or a metal complex of β-diketone. Due to a high contrast of alkaline dissolution rate before and after exposure, high resolution, high sensitivity, and controlled acid diffusion rate, the composition forms a pattern with satisfactory profile and minimal LER.
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