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US Patent 9362165 2D self-aligned via first process flow
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Patent
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Date Filed
May 8, 2015
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Date of Patent
June 7, 2016
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Patent Application Number
14707443
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Patent Citations Received
US Patent 11967527 Fully aligned subtractive processes and electronic devices therefrom
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US Patent 11705366 Methods for controllable metal and barrier-liner recess
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US Patent 11710658 Structure and method to improve FAV RIE process margin and Electromigration
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Patent Inventor Names
Sudharshanan Raghunathan
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Andy Wei
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Guillaume Bouche
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9362165
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Patent Primary Examiner
Nicholas Tobergte
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